Close category search window
 

Perturbation method for dielectric constant measurement of thick-film dielectric materials at microwave frequencies

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Li, D. ; Middlesex Univ., London ; Free, C.E. ; Pitt, K.E.G. ; Barnwell, P.G.

A novel technique, using a cavity perturbation method, for measuring the relative permittivity of dielectric thick-film materials is presented. Measurement data have been obtained at X-band frequencies for two kinds of dielectric thick-film material. The method combines simplicity with high accuracy and has the potential to measure films as thin as 20 μm

Published in:
Electronics Letters  (Volume:34 ,  Issue: 21 )

Date of Publication: 15 Oct 1998

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.