A novel technique, using a cavity perturbation method, for measuring the relative permittivity of dielectric thick-film materials is presented. Measurement data have been obtained at X-band frequencies for two kinds of dielectric thick-film material. The method combines simplicity with high accuracy and has the potential to measure films as thin as 20 μm
Published in:
Electronics Letters
(Volume:34
,
Issue:
21
)
Date of Publication: 15 Oct 1998