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Fast fabrication of InP-based HBT using a novel coplanar design

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6 Author(s)
Auer, U. ; Dept. of Solid-State-Electron., Gerhard-Mercator Univ., Duisburg, Germany ; Kim, S.O. ; Agethen, M. ; Velling, P.
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The authors report a novel contact design and technology for heterojunction bipolar transistors. The design consists of a base (B)-emitter (E)-collector (C) configuration with a T-shaped base. This configuration enables coplanar access to the emitter from both ground lines without air-bridge crossings. This leads to a very fast HBT fabrication procedure consisting of a double self-alignment process and only two metallisation steps

Published in:
Electronics Letters  (Volume:34 ,  Issue: 19 )

Date of Publication: 17 Sep 1998

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