High Sensitive Internal Film Stress Measurement By An Improved Micromachined Indicator Structure

As one part of a joint European project called MAXIMA, where the aim is to develop and produce a monolithically integrated three-axial accelerometer, high sensitive internal film stress measurements have been made on polysilicon films. In order to produce these accelerometer structures with high precision, it is necessary to know the mechanical properties, internal stresses and stress gradients of these films and their dependence on the process parameters.