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A sticking model of suspended polysilicon microstructure including residual stress gradient and postrelease temperature

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3 Author(s)
Youngjoo Yee ; Sch. of Electr. Eng., Seoul Nat. Univ., South Korea ; Myoungkyu Park ; Kukjin Chun

A sticking (stiction) model for a cantilevered beam is derived. This model includes the effect of the bending moment, which stems from stress gradient along the vertical direction of structural polysilicon, and the temperature during the release process. The bending moment due to the stress gradient will play an important role in evaluating antisticking efficiency since liquid tension and surface energy of microstructures tend to become smaller by newly developed antisticking techniques. The effects of stress gradient and temperature were analyzed and verified with surface-micromachined polysilicon cantilevers. By modifying the substrate polysilicon with grain-hole formation technique, the effects of residual stress gradient in polysilicon on stiction could be observed in the condition of low work of adhesion

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Microelectromechanical Systems, Journal of  (Volume:7 ,  Issue: 3 )