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Spiral inductor substrate loss modeling in silicon RF ICs

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2 Author(s)
Kuhn, W.B. ; Dept. of Electr. & Comput. Eng., Kansas State Univ., Manhattan, KS, USA ; Yanduru, N.K.

Spiral inductors constructed in silicon IC technologies possess limited quality factors due to series resistive losses, and losses within the semiconducting substrate. A new model for the less understood substrate losses illustrates how these losses can be minimized, providing quality factor increases of up to 230 percent over un-optimized designs

Published in:
Radio and Wireless Conference, 1998. RAWCON 98. 1998 IEEE

Date of Conference: 9-12 Aug 1998

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