By Topic

Fabrication of large area nanostructured magnets by interferometric lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
M. Farhoud ; Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA ; M. Hwang ; H. I. Smith ; M. L. Schattenburg
more authors

Patterned arrays of magnetic elements may be useful as media for high density magnetic storage applications. Interferometric lithography has been used to fabricate arrays of cobalt and nickel pillars with periods of 200 nm over areas of 5 cm×5 cm using a UV laser. This provides an economical and rapid method for manufacturing particle arrays

Published in:

IEEE Transactions on Magnetics  (Volume:34 ,  Issue: 4 )