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We have demonstrated the first Ga/sub 2/O/sub 3/(Gd/sub 2/O/sub 3/) insulated gate n-channel enhancement-mode In/sub 0.53/Ga/sub 0.47/As MOSFET's on InP semi-insulating substrate. Ga/sub 2/O/sub 3/(Gd/sub 2/O/sub 3/) was electron beam deposited from a high purity single crystal Ga/sub 5/Gd/sub 3/O/sub 12/ source. The source and drain regions of the device were selectively implanted with Si to produce low resistance ohmic contacts. A 0.75-/spl mu/m gate length device exhibits an extrinsic transconductance of 190 mS/mm, which is an order of magnitude improvement over previously reported enhancement-mode InGaAs MISFETs. The current gain cutoff frequency, f/sub t/, and the maximum frequency of oscillation, f/sub max/, of 7 and 10 GHz were obtained, respectively, for a 0.75/spl times/100 /spl mu/m/sup 2/ gate dimension device at a gate voltage of 3 V and drain voltage of 2 V.