Cart (Loading....) | Create Account
Close category search window

In-line statistical process control and feedback for VLSI integrated circuit manufacturing

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Scher, G. ; Hewlett Packard Co., Fort Collins, CO, USA ; Eaton, D.H. ; Fernelius, B.R. ; Sorensen, J.
more authors

A number of quality control and yield improvement techniques are used in the Hewlett Packard Fort Collins IC wafer fabrication line. Four of these are described, with examples of how each has improved quality and yield. Silicon wafer measurements obtained from the vendor or made at incoming inspection are correlated with device parameters and chip yield. Control charts on the manufacturing line are generated online from monitor wafer data entered by operators, giving immediate feedback. In addition, a daily summary report lists any chart out of control. In certain instances it is necessary to improve the process capability of an operation. A feedback technique is used to do this for operations which have predictable systematic drift. Individual wafer positions in critical operations are automatically recorded through the fabrication line. This greatly facilitates correlation of input to output parameters and pinpoints the root cause of physical, device parameter, or chip yield fluctuations. Rapid correlation of the data obtained throughout the fabrication and wafer test areas is done with a common database and tools which transform the raw data into an optimum form for analysis

Published in:

Electronic Manufacturing Technology Symposium, 1989, Proceedings. Seventh IEEE/CHMT International

Date of Conference:

25-27 Sep 1989

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.