Cart (Loading....) | Create Account
Close category search window
 

Thermal Deformation Prediction in Reticles for Extreme Ultraviolet Lithography Based on a Measurement-Dependent Low-Order Model

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Bikcora, C. ; Dept. of Electr. Eng., Eindhoven Univ. of Technol., Eindhoven, Netherlands ; Weiland, S. ; Coene, W.M.J.

In extreme ultraviolet lithography, imaging errors due to thermal deformation of reticles are becoming progressively intolerable as the source power increases. Despite this trend, such errors can be mitigated by adjusting the wafer and reticle stages based on a set of predicted deformation-induced displacements. Since this control scheme operates online, an accurate low-order model is necessary. However, finite element modeling of the reticle and its adjacent components leads to a large-scale thermo-mechanical model that should be simplified. First, parameters of the model's initial thermal condition are reduced to only a few from which numerous initial conditions can be accurately reconstructed. This entails placement of temperature sensors at the corresponding locations, and for this purpose, the discrete empirical interpolation method (DEIM) is utilized. Then, linear and nonlinear model reductions are performed via the proper orthogonal decomposition method and DEIM, respectively. The resultant model is employed in the Kalman filter to estimate the parameters of the reticle's temperature-dependent coefficient of thermal expansion from several displacement measurements and to subsequently predict the displacements that are used for control. By processing the outputs from the simulated large-scale model, this filter is shown to perform successfully, even in the presence of an unexpected initial condition.

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:27 ,  Issue: 1 )

Date of Publication:

Feb. 2014

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.