By Topic

On-chip spiral inductors with patterned ground shields for Si-based RF ICs

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Yue, C.P. ; Center for Integrated Syst., Stanford Univ., CA, USA ; Wong, S.S.

This paper presents a patterned ground shield inserted between an on-chip spiral inductor and silicon substrate. The patterned ground shield can be realized in standard silicon technologies without additional processing steps. The impacts of shield resistance and pattern on inductance, parasitic resistances and capacitances, and quality factor are studied extensively. Experimental results show that a polysilicon patterned ground shield achieves the most improvement. At 1-2 GHz, the addition of the shield increases the inductor quality factor up to 33% and reduces the substrate coupling between two adjacent inductors by as much as 25 dB. We also demonstrate that the quality factor of a 2-GHz LC tank can be nearly doubled with a shielded inductor

Published in:

Solid-State Circuits, IEEE Journal of  (Volume:33 ,  Issue: 5 )