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Spatially resolved endpoint detector for plasma etcher

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3 Author(s)
Chen, Roawen ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Rangan, S. ; Spanos, Costas J.

In this paper we present a novel spatially resolved sensor to detect the endpoint and monitor spatial uniformity for a plasma etching process. A scanning spatially-resolved optical emission spectroscopy (SROES) system was built and installed in Berkeley's Microfabrication Laboratory. This sensor system consists of a stepper motor, controller, and a monochrometer, which provides an in-situ real-time monitoring of the etching endpoint spatially. In this paper, we show the promise of this spatially-resolved endpoint detector, and explain our hardware design and the future experiment plan

Published in:

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Date of Conference:

6-8 Oct 1997