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Hybrid organic-inorganic films fabricated using atomic and molecular layer deposition

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4 Author(s)
George, S.M. ; Dept. of Chem. & Biochem., Univ. of Colorado, Boulder, CO, USA ; Lee, B.H. ; Yoon, B. ; Jen, S.H.

Atomic layer deposition (ALD) and molecular layer deposition (MLD) are based on sequential, self-limiting surface reactions that produce atomic layer controlled and conformal thin film growth. ALD can deposit inorganic films and MLD can deposit films containing organics. ALD and MLD can be used together to fabricate a wide range of flexible hybrid organic-inorganic films. The tunable mechanical properties of alucone alloys grown using Al2O3 ALD and alucone MLD may be useful as flexible barrier films. The tunable electrical conductivity of zincone alloys grown using ZnO ALD and zincone MLD may be useful as flexible transparent conducting films. These hybrid organic-inorganic films could have many applications for flexible sensors and actuators.

Published in:

Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on

Date of Conference:

16-20 June 2013