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Plasma-induced charging evaluation using SCA and PDM tools

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4 Author(s)
Karzhavin, Yuri ; White Oak Semicond., Sandston, VA, USA ; Lao, K.Q. ; Wu, W. ; Gelatos, C.

Plasma-induced charging has been characterized using unpatterned oxide wafer charging technique. Charging distributions correlate to gate oxide charging damage with antennae structure. Modification of the process by lowering pressure and increasing gas flow led to a significant decrease of the plasma-induced charging and the gate oxide damage

Published in:

Electron Devices, IEEE Transactions on  (Volume:45 ,  Issue: 3 )

Date of Publication:

Mar 1998

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