By Topic

Simulation of a Helicon plasma source using a multivariable fuzzy model

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Zhang, Z. ; Fac. of Inf. Sci. & Eng., Canberra Univ., ACT, Australia ; Rayner, J.P. ; Cheetham, A.D. ; Lund, T.

This paper reports work on the development of an automatic control system for a Helicon plasma processing source. The lack of a definitive physical model for the plasma physics of the source and the power coupling mechanism to the plasma precludes the use of traditional control algorithms. This paper develops a fuzzy model that simulates the behavior of the plasma source using the process of genetic algorithms to identify and optimize the parameters of the fuzzy model. This type of model will eventually be used to test a fuzzy control system for the plasma source. In this work, an extensive set of experimental data was acquired where the magnetic field and input power to the plasma source were varied over a wide range while the electron number density was measured. From this learning dataset, the genetic algorithm derived the values of the parameters for the difference equation that describes the system. The fuzzy model so constructed was used to predict the behavior of the source from known input parameters. Comparing the predictions with experimental observations showed that the fuzzy model was generally able to predict the behavior of the plasma as its input parameters were varied with a precision of better than 10%

Published in:

Plasma Science, IEEE Transactions on  (Volume:26 ,  Issue: 1 )