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Kinetic theory of stochastically heated RF capacitive discharges

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3 Author(s)
Zuoding Wang ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Lichtenberg, A.J. ; Cohen, R.H.

Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold Φ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on Φ, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement

Published in:

Plasma Science, IEEE Transactions on  (Volume:26 ,  Issue: 1 )

Date of Publication:

Feb 1998

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