By Topic

Kinetic theory of stochastically heated RF capacitive discharges

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Zuoding Wang ; Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA ; Lichtenberg, A.J. ; Cohen, R.H.

Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold Φ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on Φ, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement

Published in:

Plasma Science, IEEE Transactions on  (Volume:26 ,  Issue: 1 )