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Total-dose and SEU characterization of 0.25 micron CMOS/SOI integrated circuit memory technologies

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7 Author(s)
Brothers, C. ; Phillips Lab., Space Mission Technol. Div., Kirtland AFB, NM, USA ; Pugh, R. ; Duggan, P. ; Chavez, J.
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Total-dose and single-event-effect radiation characterization of 0.25 micron test macro SRAMs fabricated at IBM's East Fishkill research foundry in un-hardened bulk and un-hardened partially-depleted SOI silicon, are reported. The design and fabrication process were optimized for high-performance and short access time using supply voltages of 2.5 V for the 64 K-bit and 1.8 V for the 144 K and 288 K-bit test macro SRAMs

Published in:
Nuclear Science, IEEE Transactions on  (Volume:44 ,  Issue: 6 )

Date of Publication: Dec 1997

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