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Effects of F- ions and F2 molecules on the oscillation process of a discharge-pumped ArF excimer laser

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6 Author(s)
Nagai, S. ; Dept. of Quantum Eng., Nagoya Univ., Japan ; Sakai, M. ; Furuhashi, H. ; Kono, Akihiro
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Time-resolved number densities of the fluorine negative ion in a discharge-pumped ArF excimer laser are measured by a dye laser absorption method. The peak density of F- is 0.93 ×10 15 cm-3 at a total gas pressure of 2.5 atm, a gas mixture ratio of F2-Ar-He=0.2-10.0-89.8, and a charging voltage of 28 kV for a 68-nF storage capacitor bank. The dependences of the peak F- density and the ArF laser output power on the F 2 gas fraction in F2-Ar-He mixture are investigated. The effects of F- ions and F2 molecules on the ArF laser oscillation process are discussed by considering the F2 mixture-ratio dependences of particle densities, laser output power, mean electron energy, and laser power extraction efficiency. With increasing F2 mixing ratio, the ArF* excimer formation first increases as F- increases, but in F2-rich conditions the laser power decreases because of the laser photon absorption due to F- ions and quenching of ArF* with F2 molecules

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Quantum Electronics, IEEE Journal of  (Volume:34 ,  Issue: 1 )