By Topic

Local growth studies of CVD diamond using a probe-like substrate

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
J. O. Berghaus ; Plasma Technol. Res. Center, McGill Univ., Montreal, Que., Canada ; J. -L. Meunier ; F. Gitzhofer

Diamond films produced by Ar/H2/CH4 RF induction plasmas have high growth rates but often lack uniformity across the substrate. In this paper, the diamond growth on a probe-like molybdenum substrate, 4.76 mm in diameter, is correlated with the location of the probe in the plasma flame. Optical emission spectroscopy is used to characterize the plasma during deposition. The differences in gas temperature and electron density between the central and the outer region of the flame, as well as the variations in heat flux to the substrate at the different positions, are well reflected in the formed deposit. It is shown that uniform growth can only be expected within the homogeneous core of the plasma. The paper also addresses the gas phase boundary layer above the growing film. Spatially resolved emission spectroscopy measurements of concentration evolution inside the boundary layer region are made possible by the small dimensions of the substrate. A decrease in thermal boundary layer thickness from approximately 4.5 to 3 mm induced by an increase in plasma power enhances the lateral growth of the individual diamond crystallites and improves surface coverage. The typical film thickness growth rate of 70 μm/h is, however, not seen to be affected

Published in:

IEEE Transactions on Plasma Science  (Volume:25 ,  Issue: 5 )