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Fabrication of Multilevel Silicon Diffractive Lens at Terahertz Frequency

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5 Author(s)
Saha, S.C. ; Electron. & Nanoscale Eng. Dept., Univ. of Glasgow, Glasgow, UK ; Li, C. ; Ma, Y. ; Grant, J.P.
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In this paper, we fabricated an anisotropically etched multilevel silicon diffractive lens. The operating frequency and focal length of the lens are 2.52 THz and 15 mm, respectively. Both 4- and 16-level lenses have been realized. The total etch depth and size of the lenses are 49 μm and 45 mm × 45 mm. Positive tone thick resist AZ 4562 was used as a mask material for dry etching the high resistivity silicon substrate. We have characterized the lens using a high power continuous wave far infrared laser operating at 2.52 THz. The measured results show good agreement with the designed specifications.

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Terahertz Science and Technology, IEEE Transactions on  (Volume:3 ,  Issue: 4 )