Level set methods for etching, deposition and photolithography development

Level set techniques are numerical techniques for tracking moving interfaces, and have been applied to a wide collection of problems in front propagating and surface advancement. The techniques are robust, accurate, unbreakable, and extremely fast, and can be applied to highly complex two and three dimensional surface topography evolutions in etching, deposition, and photolithography, including sensitive flux/visibility integration laws, simultaneous etching and deposition, effects of non-convex sputter laws demonstrating faceting, as well as ion-sputtered re-deposition and re-emission with low sticking coefficients, and surface diffusion.