By Topic

The integration of SnO2 thin-film onto micro-hotplate for gas sensor applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Lie-Yi Sheng ; Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., Hong Kong ; P. C. H. Chan ; J. K. O. Sin

Anisotropic silicon etching techniques have been widely used in various microsensors to create thermally isolated structures or micro-hotplate (MHP). EDP (Ethylene-diamine-pyrocatechol) is one of the most commonly used anisotropic etchants because of its high selectivity of silicon compared to masking materials such as silicon dioxide. To integrate sensor arrays of various types of SnO2 thin-film sensors on the microstructure, we need to find a way to photolithographically pattern the SnO2 thin-film. In this paper we report results from such experiments

Published in:

Electron Devices Meeting, 1997. Proceedings., 1997 IEEE Hong Kong

Date of Conference:

30 Aug 1997