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Metal Nano-Grating Optimization for Higher Responsivity Plasmonic-Based GaAs Metal-Semiconductor-Metal Photodetector

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5 Author(s)
Karar, A. ; Electron Sci. Res. Inst., Edith Cowan Univ., Joondalup, WA, Australia ; Chee Leong Tan ; Alameh, K. ; Yong Tak Lee
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To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.

Published in:

Lightwave Technology, Journal of  (Volume:31 ,  Issue: 7 )

Date of Publication:

April1, 2013

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