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A CMOS-Compatible, Low-Loss, and Low-Crosstalk Silicon Waveguide Crossing

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7 Author(s)
Yi Zhang ; Dept. of Electr. & Comput. Eng., Univ. of Delaware, Newark, DE, USA ; Shuyu Yang ; Lim, A.E.-J. ; Guo-Qiang Lo
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We demonstrated a waveguide crossing for submicron silicon waveguides with average insertion loss of 0.18±0.03 dB and crosstalk of -41±2 dB, uniform across an 8-inch wafer. The device was fabricated in a CMOS-compatible process using 248 nm lithography, with only one patterning step.

Published in:

Photonics Technology Letters, IEEE  (Volume:25 ,  Issue: 5 )