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Flexible Dual-Gate Oxide TFTs Gated by Chitosan Film on Paper Substrates

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4 Author(s)
Wei Dou ; Key Lab. for Micro-Nano Optoelectron. Devices of Minist. of Educ., Hunan Univ., Changsha, China ; Liqiang Zhu ; Jie Jiang ; Qing Wan

Low-voltage flexible dual-gate indium-tin-oxide-based thin-film transistors (TFTs) are self-assembled on SiO2-covered paper substrates by one shadow mask diffraction method. Solution-processed chitosan gate dielectric films have a large gate specific capacitance (5.8 μF/cm2) due to the electric-double-layer effect. The subthreshold swing, drain-current on/off ratio, and field-effect mobility are estimated to be 80 mV/dec, 4 ×106, and 9.3 cm2/V·s, respectively. Low-voltage operation mechanism and threshold voltage modulation of such dual-gate paper TFTs are investigated.

Published in:

Electron Device Letters, IEEE  (Volume:34 ,  Issue: 2 )