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Demonstration of Lateral IGBTs in 4H-SiC

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9 Author(s)
Kuan-Wei Chu ; Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan ; Wen-Shan Lee ; Chi-Yin Cheng ; Chih-Fang Huang
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Lateral insulated gate bipolar transistors (IGBTs) in 4H-SiC are demonstrated for the first time. The devices were fabricated based on three different designs to investigate the effects of buffer doping and carrier lifetime on device performance. Experimental results show that, with a lightly doped buffer, a short drift region length, and an improved carrier lifetime, the common base current gain of the parasitic bipolar junction transistor (BJT) is improved, leading to a higher current capability of the IGBT. The differential on-resistance of the lateral IGBT with Ld = 20 μm is smaller than that of a lateral MOSFET counterpart, implying partial conductivity modulation in the drift region.

Published in:

Electron Device Letters, IEEE  (Volume:34 ,  Issue: 2 )