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Photonic microdisk resonators in aluminum nitride

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2 Author(s)
Ghosh, Siddhartha ; Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA ; Piazza, Gianluca

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.4772601 

We demonstrate integrated photonic microdisk resonators in sputtered c-axis oriented aluminum nitride (AlN) films. A 400 nm thick layer of AlN was patterned in a single lithography step with silicon dioxide used for the top and bottom cladding layers. AlN disks with a radius of 20 μm at various spacings to an 850 nm wide waveguide were tested. A loaded quality factor of 28 350 is shown in these microdisks, with an extracted peak shift over power ratio of 0.0495 pm/μW. The demonstration of photonic resonators in a piezoelectric material can lead to novel optomechanical functionalities.

Published in:

Journal of Applied Physics  (Volume:113 ,  Issue: 1 )