By Topic

Towards Wafer Scale Inductive Determination of Magnetostatic and Dynamic Parameters of Magnetic Thin Films and Multilayers

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
S. Sievers$^{1}$ Physikalisch-Technische Bundesanstalt,, Braunschweig,, Germany ; N. Liebing ; P. Nass ; S. Serrano-Guisan
more authors

We investigate an inductive probe head suitable for noninvasive characterization of the magnetostatic and dynamic parameters of magnetic thin films and multilayers on the wafer scale. The probe is based on a planar waveguide with rearward high frequency connectors that can be brought in close contact to the wafer surface. Inductive characterization of the magnetic material is carried out by vector network analyzer ferromagnetic resonance. Analysis of the field dispersion of the resonance allows the determination of key material parameters such as the saturation magnetization MS or the effective damping parameter aeff. Three waveguide designs are tested. The broadband frequency response is characterized and the suitability for inductive determination of MS and aeff is compared. Integration of such probes in a wafer prober could in the future allow wafer scale in-line testing of magnetostatic and dynamic key material parameters of magnetic thin films and multilayers.

Published in:

IEEE Transactions on Magnetics  (Volume:49 ,  Issue: 1 )