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A novel multistage fabrication method was used to create uniform silicon micro-rod array with controlled density and size characteristics, as basis for micro-machining applications. This method includes texturing using TMAH wet etching, electrochemical anodic etching, and NaOH post-processing stages. Scanning Electron Microscopy (SEM) and image analysis was used to characterize the micro-rods and the silicon surface morphology. The directional growth of the micro-rods can be credited to textured surface created by the anisotropic etching of the Si (100) orientation surface. The textured silicon surface is made of pyramids with controlled density and size distribution resulting in the creation of microrod array with pre-determined density and location. The well-controlled etching time of the NaOH post-processing stage results in the creation of the microrod array with tunable size characteristics.