Referenced Items are not available for this document.
The increasing complexity in industrial plasma processing demands new strategies for process control and monitoring. The energy transport mechanisms in the interface region between non-thermal low-pressure plasma and surface are of particular importance. Measurements of the “in situ” surface condition, which strongly affects the plasma-surface interaction processes, are extremely challenging. The most promising approach for advanced process monitoring is the active coupling of semi-kinetic simulations and diagnostics.
Published in:
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Date of Conference: 8-13 July 2012
- Page(s):
- 3P-110
- ISSN :
- 0730-9244
- E-ISBN :
- 978-1-4577-2128-1
- Print ISBN:
- 978-1-4577-2127-4
- INSPEC Accession Number:
- 13194396
- Conference Location :
- Edinburgh
- Digital Object Identifier :
- 10.1109/PLASMA.2012.6383895
- Product Type:
- Conference Publications
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