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The increasing complexity in industrial plasma processing demands new strategies for process control and monitoring. The energy transport mechanisms in the interface region between non-thermal low-pressure plasma and surface are of particular importance. Measurements of the “in situ” surface condition, which strongly affects the plasma-surface interaction processes, are extremely challenging. The most promising approach for advanced process monitoring is the active coupling of semi-kinetic simulations and diagnostics.
Date of Conference: 8-13 July 2012