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The effective electron mobility in long-channel silicon-on-insulator junctionless multigate metal-oxide-semiconductor transistors is experimentally studied. It is found that the mobility in heavily doped narrow nanowire (NW) devices at low to moderately high carrier densities significantly exceeds that in wide (planar) devices with the same silicon thickness and doping and, in a certain range of carrier densities, it exceeds the mobility in bulk silicon with the same doping concentration. This effect increases when decreasing the NW width. The possible origins of this effect are discussed. These results are extremely encouraging for the development of junctionless NW transistors.