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Efficient transformation of cyclohexaneg to methane, ethylene, and acetylene in argon dielectric barrier discharge is reported. In the absence of another H-atom donating source in the reaction mixture, such products' generation suggests in situ fragmentation of a fraction of parent molecules to C1 and C2 stages, followed by preferential reactions of these fragments with H-atoms freed along. Simultaneous formation of nonvolatile deposits containing diverse oxygenated and nonoxygenated long-chained aliphatic and cyclic compounds also occurred due to the remaining fraction's reactions, including some with the unreacted parent and the adsorbed moisture on dielectric surfaces. The presence of 4% O2 in the gas mixture induced a significant decrease in gas-phase hydrocarbons' yields in addition to a change in the nonvolatile products' nature.