Cart (Loading....) | Create Account
Close category search window

Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Fukuda, Yasuyuki ; BMG Co., Ltd., Sendai 983-0036, Japan and Department of Materials Processing, Graduate School of Engineering, Tohoku University, Sendai 980-8577, Japan ; Saotome, Yasunori ; Nishiyama, Nobuyuki ; Takenaka, Kana
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Here, the authors fabricated a mold consisting of nanodot arrays with an 18-nm pitch and performed nanoimprinting of metallic glass for developing bitpatterned media (BPM) with an areal recording density of 2 Tbit/in.2. Specifically, they investigated the feasibility of SiO2/Si mold fabrication by metal mask patterning with focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). SiO2 was etched with a mixed gas of CHF3 and O2, resulting in successful fabrication of convex nanodot arrays with an 18-nm pitch. The authors attempted nanoimprinting of Pd-based metallic glass with the fabricated SiO2 mold and clearly confirmed the replication of the fine nanohole pattern. These results suggest that the proposed FIB-CVD and RIE process is a promising method for fabricating ultrafine nanodot arrays and that metallic glasses are excellent nanoimprintable materials for mass-produced nanodevices such as BPM with ultrahigh recording density.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:30 ,  Issue: 6 )

Date of Publication:

Nov 2012

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.