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Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass

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7 Author(s)
Fukuda, Yasuyuki ; BMG Co., Ltd., Sendai 983-0036, Japan and Department of Materials Processing, Graduate School of Engineering, Tohoku University, Sendai 980-8577, Japan ; Saotome, Yasunori ; Nishiyama, Nobuyuki ; Takenaka, Kana
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Here, the authors fabricated a mold consisting of nanodot arrays with an 18-nm pitch and performed nanoimprinting of metallic glass for developing bitpatterned media (BPM) with an areal recording density of 2 Tbit/in.2. Specifically, they investigated the feasibility of SiO2/Si mold fabrication by metal mask patterning with focused ion beam assisted chemical vapor deposition (FIB-CVD) and reactive ion etching (RIE). SiO2 was etched with a mixed gas of CHF3 and O2, resulting in successful fabrication of convex nanodot arrays with an 18-nm pitch. The authors attempted nanoimprinting of Pd-based metallic glass with the fabricated SiO2 mold and clearly confirmed the replication of the fine nanohole pattern. These results suggest that the proposed FIB-CVD and RIE process is a promising method for fabricating ultrafine nanodot arrays and that metallic glasses are excellent nanoimprintable materials for mass-produced nanodevices such as BPM with ultrahigh recording density.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:30 ,  Issue: 6 )

Date of Publication:

Nov 2012

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