By Topic

Anomalous Magnetization Behavior of Fe-N Films Deposited by Reactive Pulsed Laser Deposition

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Jing Li ; State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, , Zhejiang University, , Hangzhou, China ; Yinzhu Jiang ; Tianyu Ma ; Deren Yang
more authors

A series of Fe-N films with thickness of 200 nm have been prepared by reactive pulsed laser deposition (PLD) at 25°C and at 150°C in various nitrogen pressures. Both series of samples consist of mixtures of γ'-Fe 4N and α-Fe phase. The amount of α-Fe decreases with the increase of nitrogen pressure. Higher remnant ratio and lower coercivity are observed for the films deposited at 150°C compared to the films deposited at 25°C. An anomalously large magnetization is observed for both series of films deposited at a nitrogen pressure of 8 mTorr. The average magnetization is as high as or even larger than that of α-Fe. Conversion electron Mössbauer spectroscopy demonstrated that the highest-magnetization film consists mixtures of γ'-Fe4N and α-Fe phase at a mole ratio of 1:6. The origin of this intriguing high moment is ascribed to a certain lattice constant of the α-Fe which is in a heterogeneous state with γ'-Fe4N for films deposited at a certain nitrogen pressure.

Published in:

IEEE Transactions on Magnetics  (Volume:48 ,  Issue: 11 )