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High-speed plasmonic nanolithography with a solid immersion lens-based plasmonic optical head

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11 Author(s)
Kim, Taeseob ; School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-749, South Korea ; Lee, Won-Sup ; Hang-Eun Joe ; Lim, Geon
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This letter describes the use of a plasmonic optical head to achieve high-speed nanopatterning. A plasmonic optical head employs both a sharp-ridged nanoaperture and a nanogap control to maintain the nanogap required for near-field nanolithography. The nanogap control uses a gap error signal produced by evanescent coupling through the air-gap. We demonstrate that a plasmonic optical head achieves a patterning resolution of 70 nm and a patterning speed of 100 mm/s. The proposed combination of a surface plasmon nanoaperture and a nanogap servo system is one of the strategies used to achieve high-speed, high-resolution nanolithography.

Published in:

Applied Physics Letters  (Volume:101 ,  Issue: 16 )

Date of Publication:

Oct 2012

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