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Lithography simulation for the fabrication of silicon photonic devices with deep-ultraviolet lithography

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8 Author(s)
Xu Wang ; Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada ; Wei Shi ; Hochberg, M. ; Adam, K.
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We demonstrate the lithography simulation for the fabrication of silicon photonic devices using deep-ultraviolet lithography. Once the distortions arising from the fabrication process are accounted for, the comparison between predicted and measured results is excellent.

Published in:

Group IV Photonics (GFP), 2012 IEEE 9th International Conference on

Date of Conference:

29-31 Aug. 2012

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