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We present the design, implementation and test of a CMOS image sensor filter technology based on the exploitation of surface plasmon resonance. We demonstrate precise design and control of the spectral response of filters made in a single aluminium film. The film is patterned using electron beam lithography and reactive ion etching. Unlike conventional filter technology for CMOS, all the desired colour responses can be obtained in a single lithographic sequence. We show that the photocurrent from the sensors has the required spectral response after fabrication.