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The need to fabricate photonic crystals from lithium niobate (LN) with accurate feature sizes is important to the development of optoelectronic devices. This paper reports a fabrication process to dry etch X-cut LN at a submicron scale using electron beam lithography and chromium as a hard mask. The chromium mask was used for both dry-etching and wet-etching in a unique method. Problems and solutions found during fabrication are presented. Arrays consisting of 400 nm diameter holes with a high aspect ratio were etched in LN, creating photonic crystals modeled to transmit light in the infrared spectrum.