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In-situ fabrication of {111} mirror and optical bench using double-sided anisotropic wet etching of {100} silicon wafer

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5 Author(s)
Jung-Mu Kim ; Dept. of Electron. Eng., Chonbuk Nat. Univ., Jeonju, South Korea ; Hyunseok Kim ; Sunghyun Yoo ; Kook-Nyung Lee
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This work presents a novel fabrication method for {111} dual mirror and optical bench using double-sided anisotropic wet etching of <;100>; oriented silicon wafer. The roughness of the wet etched {111} plane is 8 nm.

Published in:

Optical MEMS and Nanophotonics (OMN), 2012 International Conference on

Date of Conference:

6-9 Aug. 2012