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X-ray reflectivity measurement of a iridium coated MEMS optic with atomic layer deposition

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8 Author(s)
Ogawa, T. ; Dept. of Phys., Tokyo Metropolitan Univ., Hachioji, Japan ; Ezoe, Y. ; Mitsuishi, I. ; Kakiuchi, T.
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We coated a MEMS-based silicon optic with iridium by means of atomic layer deposition. Its X-ray reflectivity is quantitatively measured using a parallel X-ray beam at Al Kα 1.49 keV.

Published in:

Optical MEMS and Nanophotonics (OMN), 2012 International Conference on

Date of Conference:

6-9 Aug. 2012