By Topic

Plasma cleaning of TCO surfaces prior to CdS/CdTe deposition

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
DE Swanson ; Mater. Eng. Lab., Colorado State Univ., Fort Collins, CO, USA ; RM Lutze ; WS Sampath ; JD Williams

We describe a hollow cathode plasma formed within a heated pocket deposition (HPD) source covered with a transparent conductive oxide (TCO)-coated substrate. Super-hydrophilic behavior and little change in TCO transmission of TCO substrates exposed to the plasma are observed. The “plasma cleaner” source was placed in-line with the CSU advanced deposition system (ARDS), and CdS and CdTe films were deposited on both plasma and conventionally cleaned substrates. Plasma-cleaned substrates result in improved cadmium sulfide films without pinholes after plasma exposure times as short as 5 sec. Cells formed with plasma cleaned substrates display improved VOC, fill factor, and efficiency.

Published in:

Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE

Date of Conference:

3-8 June 2012