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Effect of A-site La and Ba doping on threshold field and characteristic temperatures of PbSc0.5Ta0.5O3 relaxor studied by acoustic emission

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4 Author(s)
Dul'kin, E. ; Department of Applied Physics, The Hebrew University of Jerusalem, Jerusalem 91904, Israel ; Mihailova, B. ; Gospodinov, M. ; Roth, M.

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The structural transitions in Pb1-xLaxSc(1+x)/2Ta(1-x)/2O3, x = 0.08 (PLST) relaxor crystals were studied by means of acoustic emission (AE) under an external electric field (E) and compared with those observed in pure PbSc0.5Ta0.5O3 (PST) and Pb0.78Ba0.22Sc0.5Ta0.5O3 (PBST) [E. Dul'kin etal, EPL 94, 57002 (2011)]. Similar to both the PST and PBST compounds, in zero field PLST exhibits AE corresponding to a para-to-antiferroelectric incommensurate phase transition at Tn = 276 K, lying in the vicinity of dielectric temperature maximum (Tm). This AE signal exhibits a nontrivial behavior when applying E resembling the electric-field-dependence of Tn previously observed for both the PST and PBST, namely, Tn initially decreases with the increase of E, attains a minimum at a threshold field Eth = 0.5 kV/cm, accompanied by a pronounced maximum of the AE count rate  = 12 s-1, and then starts increasing as E enhances. The similarities and difference between PST, PLST, and PBST with respect to Tn, Eth, and are discussed from the viewpoint of three mechanisms: (i) chemically induced random local electric field due to the extra charge on the A-site ion, (ii) disturbance of the system of stereochemically active lone-pair electrons of Pb2+ by the isotropic outermost electron shell of substituting ion, and (iii) change in the tolerance factor and elastic field to the larger ionic radius of the substituting A-site ion due to the different radius of the substituting ion. The first two mechanisms influence the actual values of Tn and Eth, whereas the latter is shown to affect the ormalized , indicating the fractions undergoing a field-induced crossover from a modulated antiferroelectric to a ferroelectric state. Creation of secondary random electric field, caused by doping-induced A-site-O ionic chemical bonding, is discussed.

Published in:
Journal of Applied Physics  (Volume:112 ,  Issue: 6 )

Date of Publication: Sep 2012

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