By Topic

Negative differential resistance of a delta-doping-induced double-barrier quantum-well diode at room temperature

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Wang, R.-L. ; Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan ; Su, Yan-Kuin ; Wang, Y.H. ; Yarn, K.F.

A resonant-tunneling homojunction diode, which is a delta-doping-induced double-barrier quantum-well (D/sup 3/BQW) diode, is presented. The barrier uses the delta n/sup +/-i- delta p/sup +/-i- delta n/sup +/ structure. The current-voltage characteristics exhibit three sections of negative differential resistance (NDR) phenomena. At low bias, N-type NDR is demonstrated due to the resonant-tunneling effect. At higher bias, another N-type NDR appears due to the heating effect in the high electric field. As the external bias increases further, an S-type NDR is observed. This result is attributed to the impact ionization effect of thermionic electrons, and then trapping of holes in the maxima of the valence bands, resulting in barrier lowering and redistribution of voltage.<>

Published in:

Electron Device Letters, IEEE  (Volume:11 ,  Issue: 10 )