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Opto-electrical properties of amorphous carbon thin films deposited by Aerosol-Assisted Chemical Vapor Deposition

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4 Author(s)
A. N. Fadzilah ; NANO-ElecTronic Center (NET), Faculty of Electrical Engineering, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia ; K. Dayana ; U. M. Noor ; M. Rusop

Amorphous carbon (a-C) thin films was deposited using Aerosol-Assisted CVD (AACVD) method and the properties was discussed. Flow rate of the experimental setup was varied (15, 30, 45 and 60 bubbles per minute) in order to optimize the a-C thin film characteristics and the electrical, optical and structural properties were investigated. The electrical properties was characterized by current-voltage (I-V) characteristics using Solar Simulator system and the analysis stressed on the linear (ohmic) graph for the a-C thin films. Photoresponse characteristics of the deposited a-C was highlighted when being illuminated (AM 1.5 illuminations: 100 mW/cm2, 25°C). Optical characteristics was investigated by UV-Vis-NIR spectroscope and transmittance spectrum exhibit a large transmittance value (>;85%) and high absorption coefficient value (>;106 cm-1) at the visible range of 390 to 790 nm. For structural properties, Atomic Force Microscope was used for the characterization process to obtain a-C images at atomic level.

Published in:

2012 IEEE Symposium on Humanities, Science and Engineering Research

Date of Conference:

24-27 June 2012