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Resonant surface enhancement of Raman scattering of Ag nanoparticles on silicon substrates fabricated by dc sputtering

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5 Author(s)
Fang, Yingcui ; Vacuum Section of Hefei University of Technology, Hefei, Anhui, 230009, China and School of Materials Science and Engineering, Center for Innovative Fuel Cell and Battery Technologies, Georgia Institute of Technology, Atlanta, Georgia 30332-0245 ; Li, Xiaxi ; Blinn, Kevin ; Mahmoud, Mahmoud A.
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Ag nanoparticles (AgNPs) were deposited onto silicon substrates by direct current (dc) magnetron sputtering. The influences of sputtering power and sputtering time on the AgNP film morphology were studied using atomic force microscopy. The particle size was successfully tuned from 19 nm to 53 nm by varying the sputtering time at a dc power of 10 W. When Rhodamine 6 G (R6G) was used as the probe molecule, the AgNP films showed significant surface enhanced Raman scattering effect. In particular, it is found that larger particles show stronger enhancement for lower concentrations of R6G while smaller particles display stronger enhancement for higher concentrations of R6G.

Published in:

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:30 ,  Issue: 5 )

Date of Publication:

Sep 2012

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