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A Phosphine Sub Atmospheric Delivery System (SADS) Applied to Low Pressure Chemical Vapor Deposition (LPCVD) of In-Situ Doped Polysilicon

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4 Author(s)
Bowser, J. ; Center for Nanoscale Sci. & Technol., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA ; Young, W. ; Lei Chen ; Luciani, V.

A phosphine SADS has been fitted to a conventional LPCVD furnace system. Through careful design and implementation, we have demonstrated an inherently safe system with significantly lower infrastructure requirements and costs that meet all semiconductor industry safety requirements.

Published in:

University/Government/Industry, Micro/Nano Symposium (UGIM), 2012 19th Biennial

Date of Conference:

9-10 July 2012