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We demonstrate a through-etched grating coupler based on subwavelength nanostructure. The grating consists of arrays of 80 nm × 343 nm rectangular air holes, which can be patterned in a single lithography/etch. A peak coupling efficiency of 59% at 1551.6 nm and a 3 dB bandwidth of 60 nm are achieved utilizing the silicon-on-insulator platform with a 1 μm thick buried-oxide layer for transverse electric mode. The performance is comparable to gratings requiring much more complicated fabrication processes.
Published in:
Applied Physics Letters
(Volume:101
,
Issue:
3
)
Date of Publication: Jul 2012
- Page(s):
- 031109 - 031109-4
- ISSN :
- 0003-6951
- Digital Object Identifier :
- 10.1063/1.4737412
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 19 July 2012
- Issue Date :
- Jul 2012
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