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We demonstrate for the first time that the high-k gate dielectric reliability is dramatically improved by replacing metal gate electrode with graphene gate electrode. The atomic-scale thickness and flexible nature of graphene completely eliminate mechanical stress in the high-k gate dielectric, resulting in significant reduction of trap generation in the high-k film. Almost all the electrical properties related to reliability of MOSFET such as the PBTI, TDDB, leakage current, etc are significantly improved. Data retention and program/erase properties of charge trap Flash memory are also greatly improved.
VLSI Technology (VLSIT), 2012 Symposium on
Date of Conference: 12-14 June 2012