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Browse Journals & Magazines > Applied Physics Letters ...> Volume:100 Issue:26 Help

Improvement of oxygen vacancy migration through Nb doping on Ba0.7Sr0.3TiO3 thin films for resistance switching random access memory application

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3 Author(s)
Jung, Chang Hwa ; Department of Chemical and Biomolecular Engineering, Center for Ultramicrochemical Process Systems (CUPS) and Graduate School of EEWS (WCU), Korea Advanced Institute of Science and Technology (KAIST), 373-1, Guseong-dong, Yuseong-gu, Daejeon 305-701, South Korea ; Park, Moon Kyu ; Woo, Seong Ihl

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Undoped and Nb-doped Ba0.7Sr0.3TiO3 (BST) thin films were fabricated by RF magnetron sputtering. The bipolar resistance switching behaviors of both thin films were observed with the stable endurance by DC voltage sweep. Nb doping in BST influenced the defect distribution and improved the uniformity of resistance switching random access memory (ReRAM) properties. The defect distribution was strongly related to the resistance switching properties and the decrease in the grain size caused by Nb doping made the oxygen migration more efficient. The oxygen migration in BST was assisted by Nb dopants which increased the concentration of the non-lattice oxygen in BST layer during ReRAM operation.

Published in:
Applied Physics Letters  (Volume:100 ,  Issue: 26 )

Date of Publication: Jun 2012

Page(s):
262107 - 262107-5
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.4730400
Product Type:
Journals & Magazines
Date of Current Version :
28 June 2012
Issue Date :
Jun 2012

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