By Topic

CMOS-integrated geometrically tunable optical filter

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Lerose, D. ; X-FAB Semicond. Foundries AGexample, Erfurt, Germany ; Gabler, D. ; Junger, S.

Commonly, optical filters consist of pigments on glass or of many stapled interference layers. In both cases, they are not applied on CMOS devices within the fab line, but through further processing, which also involves additional costs. In addition to this, pigment-based filters do not allow to perform a spectral analysis, which needs multichannel-based sensors, i.e. more than four different filters. Two methods for producing optical filters in the CMOS-line with different sensitivities are presented here. The first one consists of a structured metal layer embedded in oxide, whose working principle bases on plasmonics. The second one is a Fabry-Perot resonator with patterned cavity deposited with CMOS technology on top of the device. Both filters are characterized by a response which can be tuned by the geometric factors used in their patterning, allowing mutlichanneling. The filters have been simulated, realized and measured. The results are presented.

Published in:

Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI

Date of Conference:

15-17 May 2012