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Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis

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3 Author(s)
Kal, S. ; Fraunhofer-Inst. fuer Integrierte Schaltungen, Erlangen, Germany ; Kasko, I. ; Ryssel, H.

In this study, we report quick characterization methods of thin TiSi/sub 2/ films using spectroscopic ellipsometry and Thermal Wave Analysis (TWA). The optical as well as the electrical properties of TiSi/sub 2/ films formed using pre-amorphization implantation and the conventional technique (without pre-amorphization) were compared. The film morphology was analyzed with an atomic force microscope.

Published in:

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Date of Conference:

16-19 March 1997