By Topic

Characterization of thin TiSi2 films by spectroscopic ellipsometry and thermal wave analysis

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
S. Kal ; Fraunhofer-Inst. fuer Integrierte Schaltungen, Erlangen, Germany ; I. Kasko ; H. Ryssel

In this study, we report quick characterization methods of thin TiSi/sub 2/ films using spectroscopic ellipsometry and Thermal Wave Analysis (TWA). The optical as well as the electrical properties of TiSi/sub 2/ films formed using pre-amorphization implantation and the conventional technique (without pre-amorphization) were compared. The film morphology was analyzed with an atomic force microscope.

Published in:

Materials for Advanced Metallization, 1997. MAM '97 Abstracts Booklet., European Workshop

Date of Conference:

16-19 March 1997